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Our mission: Bringing practical business and technical intelligence to today's structured cabling professionals

For more than 30 years, Cabling Installation & Maintenance has provided useful, practical information to professionals responsible for the specification, design, installation and management of structured cabling systems serving enterprise, data center and other environments. These professionals are challenged to stay informed of constantly evolving standards, system-design and installation approaches, product and system capabilities, technologies, as well as applications that rely on high-performance structured cabling systems. Our editors synthesize these complex issues into multiple information products. This portfolio of information products provides concrete detail that improves the efficiency of day-to-day operations, and equips cabling professionals with the perspective that enables strategic planning for networks’ optimum long-term performance.

Throughout our annual magazine, weekly email newsletters and 24/7/365 website, Cabling Installation & Maintenance digs into the essential topics our audience focuses on.

  • Design, Installation and Testing: We explain the bottom-up design of cabling systems, from case histories of actual projects to solutions for specific problems or aspects of the design process. We also look at specific installations using a case-history approach to highlight challenging problems, solutions and unique features. Additionally, we examine evolving test-and-measurement technologies and techniques designed to address the standards-governed and practical-use performance requirements of cabling systems.
  • Technology: We evaluate product innovations and technology trends as they impact a particular product class through interviews with manufacturers, installers and users, as well as contributed articles from subject-matter experts.
  • Data Center: Cabling Installation & Maintenance takes an in-depth look at design and installation workmanship issues as well as the unique technology being deployed specifically for data centers.
  • Physical Security: Focusing on the areas in which security and IT—and the infrastructure for both—interlock and overlap, we pay specific attention to Internet Protocol’s influence over the development of security applications.
  • Standards: Tracking the activities of North American and international standards-making organizations, we provide updates on specifications that are in-progress, looking forward to how they will affect cabling-system design and installation. We also produce articles explaining the practical aspects of designing and installing cabling systems in accordance with the specifications of established standards.

Cabling Installation & Maintenance is published by Endeavor Business Media, a division of EndeavorB2B.

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Media Alert: Atomera to Present at SISPAD 2023

Atomera Incorporated (Nasdaq: ATOM):

WHO:

Professor Hiu Yung Wong of San Jose University, Robert J. Mears, CTO, and Hideki Takeuchi, Vice President of Engineering of Atomera Incorporated (Nasdaq: ATOM), a semiconductor materials and technology licensing company

 

 

WHAT:

In-person presentation of San Jose State’s and Atomera’s joint poster, entitled

“Cryogenic Electron Mobility and Subthreshold Slope of Oxygen-Inserted (OI) Si Channel nMOSFETs”

 

 

WHEN:

Wednesday, September 27 from 11 p.m. – Thursday, September 28 12:30 a.m. PDT

Thursday, September 28 from 3 p.m. – 4:30 p.m. JST

 

 

WHERE:

Kobe Chamber of Commerce and Industry (KCCI), Meeting Room 1

6-1 Minatojimanakamachi, Chuo-ku,

Kobe-shi, Hyogo 650-8543, Japan

 

This poster presentation will discuss the new findings of the physical mechanism of why MST® (also referred to as “Oxygen-inserted”, or “OI Si”, in nMOSFETs channel) provides higher inversion-layer carrier mobility than a regular silicon channel, thus enabling higher ON-state current of CMOS devices compared to the baseline devices. Cryogenic-temperature electron-mobility measurement at San Jose State University revealed that Atomera’s MST film improves surface-roughness scattering by 53% compared to a regular Si channel – a significant result because surface-roughness scattering is typically the dominant mobility barrier in high vertical effective field. In addition, MST improves Coulomb scattering, which is significant at low vertical effective field, by reducing ionized dopant impurities near the gate dielectric. A simple analytical formula to describe the observed mobility behaviors of the MST film has been established for compact modeling.

Follow Atomera:

Company website: https://atomera.com/

Atomera whitepaper: https://atomera.com/news-and-blogs/

Atomera blog: https://atomera.com/news-and-blogs/

LinkedIn: www.linkedin.com/company/atomera/

About Atomera

Atomera Incorporated, one of America’s top 100 Best Small Companies in 2022 ranked by Forbes, is a semiconductor materials and technology licensing company focused on deploying its proprietary, silicon-proven technology into the semiconductor industry. Atomera has developed Mears Silicon Technology™ (MST®), which increases performance and power efficiency in semiconductor transistors. MST can be implemented using equipment already deployed in semiconductor manufacturing facilities and is complementary to other nano-scaling technologies in the semiconductor industry roadmap. More information can be found at www.atomera.com.

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