MEDIA ALERT: New Atomera White Paper Discusses Dopant Blocking Advantages for 2nm and 3nm 3-Dimensional Semiconductor Devices
By:
Atomera, Inc via
AccessWire
July 01, 2021 at 06:30 AM EDT
LOS GATOS, CA / ACCESSWIRE / June 30, 2021 / Atomera Incorporated (NASDAQ: ATOM), a semiconductor materials and technology licensing company, has released a white paper that examines the doping engineering challenges of fabricating the most advanced 3D semiconductor devices. The white paper, "MST® Dopant Blocking for Advanced 3D Applications," discusses the exacting doping requirements for devices, such as nanosheets and gate-all-around (GAA) structures. The requirements for managing abrupt interfaces, with steep doping profiles, are becoming increasingly stringent. The white paper discusses how Atomera's MST® technology can be used to control dopant diffusion in layers thinner than 5nm, meeting key requirements for advanced 3D devices. The white paper first briefly examines the history of FinFET devices, then looks at how these evolved into the latest 3D device structures. The paper then focuses on how the diffusion of dopant atoms can impair the performance of all of these devices, the challenges of minimizing dopant diffusion, and then a detailed examination of how MST is an excellent candidate for controlling dopant diffusion, especially when compared to the typical carbon-doping. The white paper is available on Atomera's website www.atomera.com. About Atomera Safe Harbor Investor Contact: Media Contact: SOURCE: Atomera, Inc View source version on accesswire.com: https://www.accesswire.com/653841/MEDIA-ALERT-New-Atomera-White-Paper-Discusses-Dopant-Blocking-Advantages-for-2nm-and-3nm-3-Dimensional-Semiconductor-Devices More NewsView MoreVia MarketBeat
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